平成30年度 ナノテクキャリアアップアライアンス

京都大学 電子線描画装置入門コース《短期型》







■募集人数: 3

■期間: 平成30年7月23日(月)~ 8月2日(木) 

     講義: 2日間(全員)、実習: 2日間(個別) 合計4日間

■会場: 京都大学ナノテクノロジーハブ拠点

(京都市左京区吉田本町 京都大学吉田キャンパス内 工学部物理系校舎3階   327号)




1日目,2日目  7月23日(月)~ 7月24日(火)

① 電子線描画の基礎(講義) 参加者全員が対象





3日目  7月25日(水)~ 7月30日(月)、8月1日(水) の何れかの日

② CADによるパターン設計(実習)

③ 基板準備と電子線描画装置による描画(実習)


4日目 7月26日(木)、7月31日(火)、8月2日(木) の何れかの日

④ 描画パターンの現像(実習)

⑤ Siドライエッチング加工(実習)

⑥ 加工構造のFE-SEM観察(実習)






(kyodai-hub@saci.kyoto-u.ac.jp、電話:075-753-5231 )


FY 2018 Nanotech Career-up Alliance

Kyoto University, Introduction to Electron-beam Lithography << Short-term type >>


■ Purpose and intended persons:

In the most-advanced semiconductor devices and MEMS, the requirement for nanoscale patterns have become important. The key technology to meet those requirement is the electron-beam lithography which can draw the fine patterns in the nanometer order.

This course is intended for the beginners of Electron-beam Lithography. The participants will learn the basic knowledge about the nanoscale patterning through the designing a nanoscale pattern by CAD, exposing the pattern on silicon wafers with oxide film by the most-advanced electron-beam lithography equipment, dry etching the pattern, and the observing the fabricated pattern with SEM.


■ Number of participants: 3 persons (maximum)

■ Time and period: From July 23 (Mon) to August 2 (Thu), 2018

4 days in total (lecture: 2 days [all participants]; practice: 2 days [individually])

■ Venue: Kyoto University Nanotechnology Hub (* Yoshida Campus, Kyoto University)



■ Contents:

Day 1 and Day 2 – July 23 (Mon) and July 24 (Tue)

[1] Fundamentals of electron-beam lithography (lecture) For all the participants

*) The following schedule will be implemented for each participant for two consecutive days. Please note that the schedule is different for each participant. The specific schedule will be adjusted after the participation has been determined.


Day 3 – July 25 (Wed), July 30 (Mon) or August 1 (Wed)

[2] Pattern design by CAD (practice)

[3] Photoresist coating by spin coater (practice)

[4] Drawing patterns by an electron-beam lithography equipment (practice)


Day 4 – July 26 (Thu), July 31 (Tue) or August 2 (Thu)

[5] Development of drawing pattern (practice)

[6] Dry etching of oxide film (practice)

[7] Observation of fabricated structures by SEM (practice)

[8] Preparation of report


■ Tuition:

Free of charge for the doctoral students and young researchers belonging to CUPAL Alliance institutions

Others: 250,000 yen (* Not including consumption tax)


■ Contact: Kyoto University Nanotechnology Hub

(kyodai-hub@saci.kyoto-u.ac.jp Phone: +81-75-753-5231)